Heim, Payne & Chorush Boosts IP Litigation Power with Addition of Patent Specialist Kyle Friesen

Friesen brings extensive experience across all phases of IP litigation, with particular strength in inter partes review (IPR) and post-grant proceedings. His technical knowledge spans several high-demand sectors, including semiconductors, medical devices, telecommunications, imaging, and consumer electronics—making him an ideal fit for Heim, Payne & Chorush’s diverse client base.

“I’m excited to join a team of litigators that consistently delivers results at the highest levels of IP law,” said Friesen. “Heim, Payne & Chorush has a long-standing reputation for handling some of the most sophisticated patent disputes in the country, and I look forward to contributing to that legacy.”

Firm co-founder Michael Heim praised the new addition, noting: “Kyle knows how intellectual property law works in both the courtroom and the boardroom. His experience before the PTAB and the Federal Circuit adds immediate value to our team and clients.”

Beyond his IP credentials, Friesen is also recognized for his pro bono advocacy, having recently succeeded in getting a Texas prisoner’s sentence reconsidered. This dual focus on legal excellence and justice underscores Friesen’s broad legal capabilities and dedication.

Friesen’s arrival comes as Heim, Payne & Chorush continues to expand its legal team in response to increasing demand for high-stakes patent litigation services. The firm has recently been ranked among the nation’s best in U.S. News & World Report’s “Best Law Firms” and consistently receives recognition in Chambers USA, Super Lawyers, IAM Patent 1000, and IP Stars.

The firm’s continued recruitment of top-tier talent—including recent additions at associate and counsel levels—signals a forward-thinking approach to litigation, particularly in areas such as standard-essential patents (SEPs), software, and biotech patents. The addition of Friesen is expected to elevate the firm’s technical bandwidth and appellate capabilities even further.